SOLUTIONS

PRODUCTS

The “Virtual Factory” Solutions Portfolio

APC Solutions | Tool Box | Overlay Analyzer | CD Analyzer | Process Expert Engineering Tool Box

APC Solutions

  • Litho Overlay Analyzer with R2R Control including:
    • FDC (Failure Detection and Classification Capabilities)
    • Measurement target sampling optimizer
  • Litho CD Analyzer with R2R Control including
    • FDC (Failure Detection and Classification Capabilities)
    • Dose Mapper Optimizer
    • Automated Gradient Calculation

Toolbox

  • Process Expert Engineering Toolbox
  • Contains more than 60 function blocks
  • Enables engineering analysis for overlay, CD and defect density
  • Engineering platform for process analysis and development

Overlay Analyzer with R2R Control

General
  • Off-line and on-line overlay analysis
  • Mix-and-match
  • Stepper-specific and user-defined parameter models
  • Flier removal
  • Wafer and field visualization
  • Wafer and lot-level analysis
  • Enables stepper matching
  • Calculates a yield prediction for current layer
  • Allows for easy connection to metrology tools
  • Intra layer analysis/ First Layer Analysis
  • Double Exposure Analysis
  • Combined Analysis
Integrated FDC Capabilities
  • Complex FDC (Failure Detection and Classification)
  • Various visualization types
    • 2D wafer and field-based
    • 3D wafer and field-based
  • Intra-lot variances
  • Yield view and yield analysis
  • More engineering capabilities
  • Allows for process monitoring and to check recipes and process data
Overlay R2R Controller Capabilities
  • Supports mix of Parameter Models
  • Grouping functions automatically adjust to optimized datasets
  • Exposure and metrology history with visualization
  • Proprietary feed-back loop
  • Unique feed-forward control
  • Allows for full tool integration

CD Analyzer with R2R Control

General
  • Off-line and on-line overlay analysis
  • Rule-based analysis setup
  • Optimized for low-volume/ high-mix productions (logic)
  • Mix-and-match
  • Enables stepper matching
  • Calculates a yield prediction for current layer
  • Allows for easy tool connection
Integrated FDC Capabilities
  • CD FDC capabilities help to solve process problems faster than before
CD R2R Controller Capabilities
  • Grouping functions automatically adjust to optimized datasets
  • Reduced number of pilots and rework lot
  • Higher throughput
  • Improved quality
  • Exposure and metrology history with visualization
  • Proprietary feed-back loop
  • Unique feed-forward control
Integrated Dose Map Optimizer
  • Algorithms analyze production CD data and project dose mapping resulting and a 70-80% reduction in time required to measure and analyze dose map data
  • Tool-specific dose map data available
  • Visualization of data
  • 3D delta plots
  • Wafer map
  • Output may be fed directly to the tool-specific Dose Mapper, creating optimized recipes

Process Expert Engineering Toolbox

General
  • Process data engineering platform
  • Software libraries support
  • Coordinate conversion
  • 2D and 3D wafer and field visualization
  • User-defined algorithms
  • Simulation of APC or process changes
  • Core functionality includes:
    • Data calculators and simulator
    • Statistical operations
    • Wafer-to-field and field-to-wafer transformations
    • Data filters
    • Eliminates time-intensive spread sheeting and data manipulation cost savings